Atomic Layer Deposition
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Discover the advancements in the field of Atomic Layer Deposition (ALD) with the second edition of Atomic Layer Deposition by Tommi Kääriäinen, published by John Wiley & Sons Inc in 2013. This comprehensive 272-page monograph is an essential resource for anyone involved in microelectronics and nanotechnology. Since the release of the first edition in 2008, ALD has become a leading deposition technology, often favored for its precision and versatility. Kääriäinen's insightful text offers a practical perspective on ALD, making it the first of its kind to thoroughly explore this innovative technique. Whether you're a researcher, engineer, or student, this book will equip you with the knowledge needed to understand and apply ALD in various applications. Don’t miss out on this invaluable addition to your professional library!
| Datum | Preis | Regulärer Preis | % Rabatt |
|---|---|---|---|
| 5. Apr. 2026 | 183,02 € | 217,22 € | -16% |
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