Atomic Layer Deposition
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Atomic Layer Deposition

Tommi Kääriäinenbookshop.eeEEEE
€ 195,02
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Live deal from bookshop.ee in EE. Current price: €195.02.

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Discover the advancements in the field of Atomic Layer Deposition (ALD) with the second edition of Atomic Layer Deposition by Tommi Kääriäinen, published by John Wiley & Sons Inc in 2013. This comprehensive 272-page monograph is an essential resource for anyone involved in microelectronics and nanotechnology. Since the release of the first edition in 2008, ALD has become a leading deposition technology, often favored for its precision and versatility. Kääriäinen's insightful text offers a practical perspective on ALD, making it the first of its kind to thoroughly explore this innovative technique. Whether you're a researcher, engineer, or student, this book will equip you with the knowledge needed to understand and apply ALD in various applications. Don’t miss out on this invaluable addition to your professional library!

Prijsgeschiedenis
DatumPrijsNormale prijs% Korting
11 apr 2026€ 195,02--
11 apr 2026€ 195,02€ 217,22-10%
5 apr 2026€ 183,02€ 217,22-16%
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SKU
9781118062777
Tags
2013Atomic layer depositionChemical vapor depositionEpitaxyGXCHardbackJohn Wiley & Sons IncK00MicroelectronicsNanotechnologyTJFD5Tommi KääriäinenUnited States
bookshop.ee
€ 195,02
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